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20-80L/Min Centrifugal Electric Coolant Pumpl For Etching Machine Liquid Cooling

Basic Properties
Place of Origin: China
Brand Name: Bextreme Shell
Certification: CE
Model Number: OWP-BL43-426C
Trading Properties
Minimum Order Quantity: 1
Price: Negotiable
Payment Terms: T/T,Western Union
Supply Ability: 1000 ocs/month
Product Summary
24V DC centrifugal pump for etching machine cooling. Delivers 20-80 L/min flow, 20m head with PWM speed control. IP68 rated, 18-month warranty, and 20,000+ hour lifespan. Multiple protections ensure reliable operation in harsh environments.

Product Details

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80L/Min electric coolant pump

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20L/Min electric coolant pump

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Centrifugal brushless electric water pump

Product Name: Electric Coolant Pump
Pumptype: Centrifugal
Standard Or Nonstandard: Standard
Voltage: 24V DC
Warranty: 18 Months
Flowrate: 20-80 L/min
Material: Aluminum Alloy
Head: 2-20m
Fuel: Electric
Product Description
Electric Coolant Pump (Model: OWP-BL43-426C)
Ideal for Etching Machine Liquid Cooling
Technical Specifications
Parameter Category Specific Details
Power Supply 24VDC (with a working range of 18-32VDC); Rated power: 240W
Flow & Lift Performance Rated Flow rate: 2400L/H at 17M head; Max Flow: 5000L/H; Max Lift Head: 20M
Compatible Media 50-60% glycol-water mixture, dielectric oil, mineral oil, electronic fluorinated solution, etc.
Connection & Control Flange Quick-Connect; Speed regulation via PWM; Fault Feedback signal available
Protection & Durability IP68 rating; Service life over 20000 hours; Reverse polarity, dry running, over voltage/current, overload, over temperature protection
Operational Environment Working ambient temperature: -40℃ to +85℃ (-40°F to +185°F); Humidity ≤90%
Additional Dimensions Connector model: AMP282106-1 (matched with plug AMP282088-1); Nozzle size: 50.5mm (Flange)
Application in Etching Machine Liquid Cooling
This OWP-BL43-426C Electric Coolant Pump is specifically engineered for liquid cooling systems in etching machines, serving as a critical component for maintaining stable etching operations. Etching machines generate substantial heat during plasma etching processes—driven by high-frequency electric fields and intense ion bombardment—particularly affecting key components like the etching head and reaction chamber. Uncontrolled heat can lead to unstable etching rates, potential equipment damage, and compromised semiconductor product quality.
The pump effectively addresses these challenges by efficiently circulating cooling media (such as 50-60% glycol-water or electronic fluorinated solution) through the etching machine's cooling circuit. It ensures consistent heat dissipation from the electrostatic chuck (ESC) and reaction chamber: by maintaining the ESC at precise temperatures, it guarantees uniform etching rates across the wafer; by stabilizing chamber wall temperatures, it controls fluctuations in etching selectivity. With a high flow rate (up to 5000L/H) and maximum lift head (20M), the pump enables rapid heat transfer even in complex cooling loops, while PWM speed regulation allows real-time adjustments to match the etching machine's dynamic heat output—ensuring optimal cooling performance throughout all operational stages.
Competitive Advantages
  • Reliable Protection Mechanisms: Equipped with multiple safeguards including reverse polarity, dry running, over voltage/current, overload, and over temperature protection to prevent pump damage and ensure continuous operation, critical for uninterrupted etching processes.
  • Efficient & Durable Design: Features a high-efficiency brushless DC motor that reduces power consumption while delivering extended service life (over 20,000 hours). The magnetic force transmission (shield pump structure) enhances leak-proof performance, protecting cooling media purity.
  • Wide Adaptability: With an IP68 rating and operational temperature range of -40℃ to +85℃, it performs reliably in harsh industrial environments where etching machines are typically deployed. The flange quick-connect design simplifies installation and maintenance, minimizing downtime.
  • Precise Control: Constant flow controlling and PWM speed regulation enable accurate adjustment of cooling capacity, aligning with the strict temperature requirements of etching processes to improve semiconductor product yield.
Technical Documentation
20-80L/Min Centrifugal Electric Coolant Pumpl For Etching Machine Liquid Cooling 0
PWM Speed Mode & Fault Feedback
20-80L/Min Centrifugal Electric Coolant Pumpl For Etching Machine Liquid Cooling 1
Performance Curve
20-80L/Min Centrifugal Electric Coolant Pumpl For Etching Machine Liquid Cooling 2
Dimensions Diagram
20-80L/Min Centrifugal Electric Coolant Pumpl For Etching Machine Liquid Cooling 3
Technical Specifications
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